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NORDSON MARCH AP-1000Plasma System

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  • 公司名稱(chēng)上海衡鵬企業(yè)發(fā)展有限公司
  • 品       牌
  • 型       號(hào)
  • 所  在  地上海
  • 廠(chǎng)商性質(zhì)代理商
  • 更新時(shí)間2024/6/11 9:29:52
  • 訪(fǎng)問(wèn)次數(shù)121
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衡鵬企業(yè)成立于1999年11月,總部設(shè)于上海,系專(zhuān)業(yè)化、集成化的電子行業(yè)綜合服務(wù)性企業(yè)。公司依托于電子產(chǎn)品制造業(yè)的發(fā)展,已在市場(chǎng)中建立起良好的商譽(yù)和廣泛的商業(yè)資源。近年來(lái),隨著市場(chǎng)的日漸成熟和業(yè)務(wù)的不斷發(fā)展,公司的業(yè)務(wù)已經(jīng)遍布中國(guó)大陸以及香港、中國(guó)臺(tái)灣市場(chǎng),深得廣大電子產(chǎn)品制造商的青睞。本公司將在緊緊跟隨信息時(shí)代的步伐,不斷為客戶(hù)提供各種優(yōu)質(zhì)的電子材料及相關(guān)設(shè)備,擴(kuò)大*,壯大自身的同時(shí),充分利用自身優(yōu)勢(shì),不斷提升自身的服務(wù)理念,致力于為客戶(hù)提供更多元化、系統(tǒng)化的技術(shù)支持及技術(shù)服務(wù),進(jìn)一步建立穩(wěn)固的銷(xiāo)售網(wǎng)絡(luò),從而將公司發(fā)展成為中國(guó)*電子行業(yè)中的企業(yè)。

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NORDSON MARCH AP-1000Plasma System
NORDSON MARCH AP-1000Plasma System 產(chǎn)品信息

Nordson AP-1000 Plasma System Features:


PLC controller with touch screen provides an intuitive graphical interface and 

real time process representation

Flexible shelf architecture allows processing of a wide variety of part carriers in either direct or 

downstream plasma mode

13.56 MHz RF generator has automatic impedance matching for unparalleled process reproducibility

Proprietary software control system generates process and production data for statistical process control


Nordson AP-1000 Plasma System Benefits:


Uniform plasma treatment for the most demanding production environments

The Nordson MARCH AP-1000 system is designed to meet the rigorous demands of 24-hour operation in high performance manufacturing environments. The system delivers uniform plasma treatment with unmatched reliability, safety and ease of operation.

The AP-1000 system is completely self-contained, requiring minimal floor space. The pump, chamber, control electronics, and 13.56 MHz RF generator are housed in a single enclosure. Full front access allows for convenient access to all interior components. The pump is positioned on rollers for easy removal.

The plasma chamber is constructed of 11-gauge stainless steel with aluminum fixtures for superior durability. The chamber has multiple removable and adjustable shelves to accommodate a range of part carriers, including magazines, trays, wafer and Auer® boats.


Enhanced productivity for high-volume capacity requirements 

The AP-1000 system with optional HTP (high throughput) shelves combines the reliability and process quality of the AP-1000 system with the proven benefits of Nordson MARCH’s unique shelf design. The AP- 1000 HTP system optimizes use of the reactive ions found in RF plasma, increasing treatment uniformity while decreasing process time. 

The AP-1000 HTP system allows selection from a range of process gases such as Argon, Hydrogen and Helium. It comes standard equipped with four mass flow controllers for optimal gas control. Slotted magazines are placed vertically inside the chamber. 

Additionally, slotted magazines can be placed vertically inside the chamber. Typically, each magazine holds a minimum of 20 lead frames. The AP-1000 plasma chamber can hold up to 12 magazines, depending on magazine size.


Nordson AP-1000 Plasma System Specifications:


Enclosure

Dimensions

W x D x H – Footprint

680W x 1127D x 1890H

(26.77W x 62.3D x 74.4H in.)

Net Weight

485 kg (1069 lbs)

Equipment Clearance

Right, Left – 153 mm (6 in.), Front-680 mm 

(27 in.) Back-483 mm (19 in.) min.

Chamber

Maximum Volume

127 liters (7774 in3)

Variable Electrode

Configurations

Power-Ground, Ground-Power, Power-Power

Number of Electrode Positions

14

Electrode Pitch

25.4 mm (1 in.) for 600 W

50.8 mm (2 in.) for 1000 W

Electrodes

Powered Working Area

349W x 425D mm (13.74W x 16.73D in.)

Ground/Perforated 

Working Area

384W x 425D mm (15.12W x 16.73D in.)

Floating Working Area

349W x 425D mm (13.74W x 16.73D in.)

RF Power

Standard Wattage

600 W

Optional Wattage

1000 W

Frequency

13.56 MHz

Gas Control

Available Flow Volumes

10, 25, 50, 100, 250, 500, 1000, 2000 or 

5000 sccm

Maximum Number of MFCs

4

Control &Interface

Software Control

PLC Control with Touch Screen Interface

Remote Interface

PlasmaLINK, ProcessLINK, SECS/GEM

Vacuum Pump

Standard Wet Pump

53 cfm with Oxygen Oil Mist Eliminator

Optional Wet Pump

53 cfm with Corrosive Oil Mist Eliminator

Optional Purged Dry Pump

63 cfm

N2 Purged Pump Flow

14 slm

Cooling Water 

Purged Pump Flow

5 slm

Facilities

Power Supply

220 V, 25 A, 50/60 Hz, 3-Phase, 

8 AWG, 4-Wire;380 V, 25 A, 50/60 Hz, 3-Phase,

8 AWG, 5-Wire

Process Gas 

Fitting Size & Type

6.35 mm (0.25 in.) OD Swagelok Tube

Process Gas Purity

Lab or Electronic Grade

Process Gas Pressure

0.69 bar (10 psig) min. to 1.03 bar 

(15 psig) max., regulated

Purge Gas Fitting Size & Type

6.35 mm (0.25 in.) OD Swagelok Tube

Purge Gas Purity

Lab or Electronic Grade N2/CDA

Purge Gas Pressure

2 bar (30 psig) min. to 6.9 bar 

(100 psig) max., regulated

Pneumatic Valves 

Fitting Size & Type

6.35 mm (0.25 in.) OD Swagelok Tube

Pneumatic Gas Purity

CDA, Oil Free, Dewpoint ≤7°C(45°F),

Particulate Size<5 µm

Pneumatic Gas Pressure

3.45 bar (50 psig) min. to 6.89 bar 

(100 psig) max.,regulated

Exhaust

38 mm (1.5 in.) OD Pipe Flange

Compliance

SEMI

S2/S8 (EH&S/Ergonomics)

International

CE Marked

Ancillary

Equipment

Gas Generators

Nitrogen, Hydrogen

(Requires Additional Non-Optional Hardware)

Facilities

Chiller, Scrubber




15700106413
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